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Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology)
Chemical Vapor Deposition for Microelectronics Principles Technology and Applications - Materials Science and Process Technology
Author: Arthur Sherman
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics and kinetics, as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use ...  more »
ISBN-13: 9780815511366
ISBN-10: 0815511361
Publication Date: 3/1/1988
Pages: 226
Rating:
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4.5 stars, based on 1 rating
Publisher: Noyes Publications
Book Type: Hardcover
Members Wishing: 0
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